si -肖特基势垒二极管在SiGe BiCMOS技术中的可靠性方面

A. Mai, A. Fox
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引用次数: 4

摘要

肖特基势垒二极管(SBD)集成在0.25 μm SiGe BiCMOS技术中。sdd的实现无需额外的工艺步骤,使用阳极肖特基势垒标准接触形成的硅化钛(TiSi)相。我们观察到反向阳极电压操作后的特定参数退化。对串联电阻Rs、正向和漏电流(IA, Ir)等不同参数以及阳极面积、接触边长度和角等设计参数进行了评估,以减少这种退化。通过s参数测量提取导通电阻Ron和电容Coff,显示出明显的衰减。最后,在最坏的运行条件下,外推了10年使用寿命的最大反向工作电压和关键参数的最大变化10%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability aspects of TiSi-Schottky barrier diodes in a SiGe BiCMOS technology
Schottky barrier diodes (SBD) were integrated in a 0.25 μm SiGe BiCMOS technology. The SBDs were realized without additional process steps using the titanium silicide (TiSi) phase of the standard contact formation for the anode Schottky barrier. We observe a specific parameter degradation after reverse anode voltage operation. Different parameters as series resistance Rs, forward and leakage currents (IA, Ir) and design parameters like anode area, contact edge lengths and corners were evaluated in order to decrease this degradation. The on-resistance Ron and capacitance Coff were extracted by s-parameter measurements and show an obvious decreased degradation. Finally maximum reverse operating voltages for a ten year life time and a maximum change of 10% for critical parameters were extrapolated for the worst operation conditions.
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