无定形硫系薄膜中的点阵全息记录

A. Bulanovs, Vjacheslavs Gerbreders, Valfrids Paschkevich, J. Teteris
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引用次数: 8

摘要

基于连续波二极管泵浦YAG:Nd SHG激光器(波长532 nm,功率30mW),利用TTL信号进行电子调制,研制了微机控制的点阵全息记录系统。采用双光束技术,会聚角为30°,PC控制入射光束平面旋转0 ~ 360°。光学系统由分束器、40mm焦距成形圆柱透镜和40mm聚焦透镜组成。实验设备的特征参数如下:光斑尺寸- 50-200微米,激光直接书写面积,受x-y定位系统限制,为70mm × 70mm,书写头旋转位置最多256个(8位),每次曝光时间- 1-1000 msec。我们使用AsxSySe1-x硫系玻璃材料作为记录材料。点阵模式下材料中书写光栅的衍射效率超过25%。通过蚀刻和随后的电镀来增强表面浮雕的原始方法已经发展。建立了专用的PC控制装置,用于金属化聚酰胺薄膜上浮雕全息图的热压印。讨论了激光在硫化物材料中的透射、反射和衍射现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dot-matrix holographic recording in amorphous chalcogenide films
We have developed PC controlled dot-matrix holographic recording system based on the CW diode pumped YAG:Nd SHG laser (wavelength 532 nm, power 30mW,) modulated electronically with TTL signals. Two-beam technique has been used with convergence angle 30o and PC controlled incident beam plane rotation 0-360o. Optical system consists of beam splitter, 40mm focus length forming cylindrical lens and 40mm focusing lens. Characteristic parameters of experimental equipment are following: spot size - 50-200 micrometers, direct laser writing area, limited by x-y positioning system, was 70mm x 70mm, number of writing head rotation positions up to 256 (8 bit), time of each exposure - 1-1000 msec. As the recording material we have used AsxSySe1-x chalcogenide glass material. Diffraction efficiency of written gratings in the material in dot-matrix regime exceeds 25%. Original method for surface relief enhancement by etching and subsequent electroplating has been developed. Special PC controlled device for thermal imprinting of relief holograms on the metallized polyamide film has been built. Measurements of light transmission, reflection, and diffraction phenomena of laser beams in processed chalcogenide materials are discussed.
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