DMOS E/D逻辑的设计与技术

M. Declerco, T. Laurent
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引用次数: 0

摘要

讨论了在实际实现DMOS增强损耗(E/D)逻辑时出现的两个问题。第一个问题涉及DMOS逻辑门的优化设计,其中必须考虑器件的某些特定特性。首先,典型的短通道特性是从全尺寸器件中获得的,这一事实深刻地改变了栅极的电特性与其实际面积之间存在的关系。其次,在计算逆变器特性时,必须考虑与简化理论的一些偏差,例如主要发生在驱动晶体管中的载流子速度饱和。从简单的数学表达式出发,开发了设计规则,并与传统的E/D逻辑进行了比较。对于DMOS逻辑,可以区分两个设计区域,对应于技术中的两个不同选项。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and technology for DMOS E/D logic
The authors discuss two problems which arise in the practical implementation of DMOS to enhancement-depletion (E/D) logic. The first problem relates the optimum design of DMOS logic gates, for which some particular features of the devices must be taken into account. First, the fact that typical short-channel characteristics are obtained from a full-size device deeply modifies the relation existing between electrical characteristics of a gate and its real estate. Second, some deviations from the simplified theory, such as carrier velocity saturation occurring mainly in the driver transistor, must be taken into account when computing the inverter characteristics. Starting from simple mathematical expressions, design rules have been developed and compared to conventional E/D logic. Two design regions, corresponding to two different options in the technology, may be distinguished for DMOS logic.
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