用升华夹层法生长的掺钒碳化硅晶体的电子和光学性质

S. Muller, D. Hofmann, E. Mokhov, M. Ramm, A. Roenkov, Y. Vodakov, A. Winnacker
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引用次数: 2

摘要

有意掺杂钒(V)的n型和p型6H碳化硅的阴极发光定位实验表明,V/sup 4+/相关红外发光和近波段供体-受体对发光(n /spl rarr/Al)存在局部反相关。这一事实表明,V是杂质的少数载流子寿命的决定因素。讨论了在晶体缺陷附近抑制V/sup 4+/发光的可能机制。通过光致发光激发测量,确定了V/sup 4+/5+/给体能级的结合能为E/sub V/ +1.57/spl plusmn/0.05 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electronic and optical properties of vanadium doped silicon carbide crystals grown by the sublimation sandwich method
Cathodoluminescence-mapping experiments of n- and p-type 6H SiC intentionally doped with vanadium (V) show a local anti-correlation of the V/sup 4+/ related IR-luminescence and the near bandedge donor-acceptor pair luminescence (N/spl rarr/Al). This fact indicates, that V acts as minority carrier lifetime determining impurity. The suppression of the V/sup 4+/ luminescence near crystallographic defects is discussed under the possible mechanism of V precipitate formation. The binding-energy of the V/sup 4+/5+/ donor level is determined to E/sub v/+1.57/spl plusmn/0.05 eV by photoluminescence excitation measurements.
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