热处理后对电子束蒸发法制备SnO2薄膜光学性能的影响

H. Mohamed, N. Hadia
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引用次数: 0

摘要

本文报道了热后退火对SnO2薄膜光学性能的影响。采用电子束蒸发技术沉积薄膜。薄膜在200 ~ 550℃的空气中退火。结果表明,退火温度对薄膜的光学性能有显著影响。薄膜在可见光区是透明的,平均透射率为83%。在500℃的温度下获得了3.65 eV的高光能隙。许多光学参数,如:折射率;消光系数;不均匀度;介电常数;单振能量;分散能源;振子强度;平均振荡器波长;静态介电常数;高频介电常数;计算了热发射率和光电阻率作为退火温度的函数。最后,由于SnO2薄膜在高退火温度下具有低热辐射率,因此可以用于透明热镜涂层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Post Thermal Annealing Effect on the Optical Properties of SnO2 Films Prepared by Electron Beam Evaporation Technique
This work reports on the effect of post thermal annealing on the optical properties of SnO2 films. The films were deposited using electron beam evaporation technique. The films were annealed in air in the temperature range 200-550 oC. It was found that the annealing temperature has a significant effect on the optical properties of these films. The films are transparent in the visible region with average transmission of 83%. A high optical energy-gap of 3.65 eV was achieved at temperature 500 oC. Many optical parameters such as: refractive index; extinction coefficient; degree of inhomogeneity; dielectric constants; single oscillator energy; dispersion energy; oscillator strength; average oscillator wavelength; static dielectric constant; high frequency dielectric constant; thermal emissivity and optical resistivity were calculated as a function of annealing temperature. Finally, SnO2 films can be used in transparent heat mirror coatings applications due to their low thermal emissivity at high annealing temperature.
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