漂移晶体管基区杂质密度分布

M. B. Das, A. Boothroyd
{"title":"漂移晶体管基区杂质密度分布","authors":"M. B. Das, A. Boothroyd","doi":"10.1109/T-ED.1961.14866","DOIUrl":null,"url":null,"abstract":"The nature of the impurity grading in the base of drift transistors is studied by measuring the dependence of the base transit time on collector voltage. Provided that modulation of collector-depletion layer width caused by change of collector voltage occurs only in the base material, as in the case of an alloyed collector, it is possible to deduce the base-region field parameterm=\\Delta V/(kT/q)from such transit-time measurements. By this means, the validity of assumed distributions of impurity density may be verified; in particular, it may be established whether the impurity grading approximates an exponential or a complementary error function (erfc) form. Results are given for a number of drift-transistor samples, most of which are believed to have undergone impurity diffusion into the base material from a constant surface concentration during fabrication. In all cases, however, interpretation of measured data indicates a base impurity-density distribution approximating exponential rather than erfc form to be present.","PeriodicalId":293956,"journal":{"name":"IRE Transactions on Electron Devices","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1961-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Impurity-density distribution in the base region of drift transistors\",\"authors\":\"M. B. Das, A. Boothroyd\",\"doi\":\"10.1109/T-ED.1961.14866\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The nature of the impurity grading in the base of drift transistors is studied by measuring the dependence of the base transit time on collector voltage. Provided that modulation of collector-depletion layer width caused by change of collector voltage occurs only in the base material, as in the case of an alloyed collector, it is possible to deduce the base-region field parameterm=\\\\Delta V/(kT/q)from such transit-time measurements. By this means, the validity of assumed distributions of impurity density may be verified; in particular, it may be established whether the impurity grading approximates an exponential or a complementary error function (erfc) form. Results are given for a number of drift-transistor samples, most of which are believed to have undergone impurity diffusion into the base material from a constant surface concentration during fabrication. In all cases, however, interpretation of measured data indicates a base impurity-density distribution approximating exponential rather than erfc form to be present.\",\"PeriodicalId\":293956,\"journal\":{\"name\":\"IRE Transactions on Electron Devices\",\"volume\":\"32 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1961-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IRE Transactions on Electron Devices\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/T-ED.1961.14866\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IRE Transactions on Electron Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/T-ED.1961.14866","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

通过测量基极传输时间对集电极电压的依赖关系,研究了漂移晶体管基极杂质分级的性质。假设由集电极电压变化引起的集电极耗尽层宽度的调制仅发生在基材中,如合金集电极的情况,则可以从这种传输时间测量中推断出基区场参数=\ δ V/(kT/q)。通过这种方法,可以验证假定的杂质密度分布的有效性;特别是,可以确定杂质分级是否近似于指数形式或互补误差函数(erfc)形式。给出了许多漂移晶体管样品的结果,其中大多数被认为在制造过程中从恒定的表面浓度中经历了杂质扩散到基材中。然而,在所有情况下,对测量数据的解释表明,基本杂质-密度分布近似于指数形式,而不是erfc形式。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impurity-density distribution in the base region of drift transistors
The nature of the impurity grading in the base of drift transistors is studied by measuring the dependence of the base transit time on collector voltage. Provided that modulation of collector-depletion layer width caused by change of collector voltage occurs only in the base material, as in the case of an alloyed collector, it is possible to deduce the base-region field parameterm=\Delta V/(kT/q)from such transit-time measurements. By this means, the validity of assumed distributions of impurity density may be verified; in particular, it may be established whether the impurity grading approximates an exponential or a complementary error function (erfc) form. Results are given for a number of drift-transistor samples, most of which are believed to have undergone impurity diffusion into the base material from a constant surface concentration during fabrication. In all cases, however, interpretation of measured data indicates a base impurity-density distribution approximating exponential rather than erfc form to be present.
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