使用缓冲涂层材料在单一基板上制造3D光耦合器和波导的工艺优化

Photonics West - Optoelectronic Materials and Devices Pub Date : 2015-04-17 DOI:10.1117/12.2080425

C. Summitt, Sung-Yuen Wang, L. Johnson, Melissa Zaverton, Tao Ge, T. Milster, Y. Takashima

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引用次数: 2

摘要

我们开发了一种混合光刻工艺，用于在单一衬底上使用相同的缓冲涂层材料制造垂直光学耦合器和波导结构阵列。内置的虚拟游标刻度使这两个结构能够精确对齐。

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Process optimization for a 3D optical coupler and waveguide fabrication on a single substrate using buffer coat material

We have developed a hybrid lithography process necessary to fabricate a vertical optical coupler and an array of waveguide structures using the same buffer coat material on a single substrate. A virtual vernier scale built into the process enables precise alignment of both structures.

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Photonics West - Optoelectronic Materials and Devices

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