基于砷化镓的modfet的性能评价

E. Kohn, A. Lepore, H. Lee, M. Levy
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引用次数: 8

摘要

实验评估了AlGaAs/InGaAs/GaAs modfet的三个关键方面,即电流处理能力、信号延迟和饱和输出状态,并将其与异质结构配置相关联。栅极长度小于0.1 μ m,相应的截止频率高于140 GHz。这三个方面是密切相关的。通过引入InGaAs量子阱,材料体系的二维电子-气体(2DEG)密度可以得到极大的扩展。然而,这只导致有限的改善,对于FET电流处理能力高于2DEG密度2*10/sup 12/ cm/sup -2/。对MODFET电流增益截止频率的主要影响是通过降低输入延迟,如0.1 μ m栅极长度器件所示。提取相同的本征延迟时间意味着AlGaAs/GaAs和伪晶modfet通道中的电子动力学非常相似。这与有效电子质量没有显著变化的事实是一致的,尽管谷间散射动力学的变化仍然是预期的。开路电压增益和输出电导与通道顶部的空间电荷层结构密切相关。这与隐窝结构有关;然而,对于大的电压增益,通常需要高的结构宽高比。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Performance evaluation of GaAs based MODFETs
Three key aspects of AlGaAs/InGaAs/GaAs MODFETs, namely current-handling capability, signal delay, and saturated output regime, are experimentally evaluated and correlated with the heterostructure configuration. Gate lengths down to 0.1 mu m and corresponding cutoff frequencies above 140 GHz are employed. The three aspects are found to be closely interrelated. By the incorporation of an InGaAs quantum well the two-dimensional-electron-gas (2DEG) density of the materials system can be considerably extended. However, this results in only limited improvement for the FET current-handling capability above a 2DEG density of 2*10/sup 12/ cm/sup -2/. The main effect on the MODFET current gain cutoff frequency is through the reduction of the input delay as demonstrated with 0.1- mu m-gate-length devices. Extracting the same intrinsic delay time means that the electron dynamics in the channel of AlGaAs/GaAs and pseudomorphic MODFETs is very comparable. This is consistent with the fact that there is no significant change in the effective electron mass, although changes in the intervalley scattering dynamics are still expected. Open-circuit voltage gain and output conductance are strongly related to the space-charge-layer configuration on top of the channel. This is related to the recess configuration; however, for a large voltage gain a high structural aspect ratio is generally needed.<>
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