C. Maneux, C. Mukherjee, M. Deng, Bruno N. Wesling, Lucas Réveil, Z. Stanojević, O. Baumgartner, G. Larrieu, I. O’Connor, A. Poittevin
{"title":"电路设计流程专门用于3D垂直纳米线场效应管","authors":"C. Maneux, C. Mukherjee, M. Deng, Bruno N. Wesling, Lucas Réveil, Z. Stanojević, O. Baumgartner, G. Larrieu, I. O’Connor, A. Poittevin","doi":"10.1109/LAEDC54796.2022.9908233","DOIUrl":null,"url":null,"abstract":"To continue transistor downscaling beyond lateral 7nm devices, gate-all-around (GAA) junction-less vertical nanowire field effect transistors (VNWFET) represent a promising option. This invited paper presents the circuit design flow based on a vertical junctionless transistor technology. On the basis of state-of-the-art junctionless nanowire transistors (JLNT), DC characterization, compact modelling, EM simulation and parameter extraction are described in details. Using this circuit design flow, a set of innovative 3D circuit architectures are explored.","PeriodicalId":276855,"journal":{"name":"2022 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-07-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Circuit Design Flow dedicated to 3D vertical nanowire FET\",\"authors\":\"C. Maneux, C. Mukherjee, M. Deng, Bruno N. Wesling, Lucas Réveil, Z. Stanojević, O. Baumgartner, G. Larrieu, I. O’Connor, A. Poittevin\",\"doi\":\"10.1109/LAEDC54796.2022.9908233\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"To continue transistor downscaling beyond lateral 7nm devices, gate-all-around (GAA) junction-less vertical nanowire field effect transistors (VNWFET) represent a promising option. This invited paper presents the circuit design flow based on a vertical junctionless transistor technology. On the basis of state-of-the-art junctionless nanowire transistors (JLNT), DC characterization, compact modelling, EM simulation and parameter extraction are described in details. Using this circuit design flow, a set of innovative 3D circuit architectures are explored.\",\"PeriodicalId\":276855,\"journal\":{\"name\":\"2022 IEEE Latin American Electron Devices Conference (LAEDC)\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-07-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE Latin American Electron Devices Conference (LAEDC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/LAEDC54796.2022.9908233\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE Latin American Electron Devices Conference (LAEDC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LAEDC54796.2022.9908233","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Circuit Design Flow dedicated to 3D vertical nanowire FET
To continue transistor downscaling beyond lateral 7nm devices, gate-all-around (GAA) junction-less vertical nanowire field effect transistors (VNWFET) represent a promising option. This invited paper presents the circuit design flow based on a vertical junctionless transistor technology. On the basis of state-of-the-art junctionless nanowire transistors (JLNT), DC characterization, compact modelling, EM simulation and parameter extraction are described in details. Using this circuit design flow, a set of innovative 3D circuit architectures are explored.