电路设计流程专门用于3D垂直纳米线场效应管

C. Maneux, C. Mukherjee, M. Deng, Bruno N. Wesling, Lucas Réveil, Z. Stanojević, O. Baumgartner, G. Larrieu, I. O’Connor, A. Poittevin
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引用次数: 0

摘要

为了在横向7nm器件之外继续缩小晶体管的尺寸,栅极全能(GAA)无结垂直纳米线场效应晶体管(VNWFET)是一个很有前途的选择。本文介绍了基于垂直无结晶体管技术的电路设计流程。在无结纳米线晶体管(JLNT)的基础上,详细描述了直流特性、紧凑建模、电磁仿真和参数提取。利用该电路设计流程,探索了一套创新的3D电路架构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Circuit Design Flow dedicated to 3D vertical nanowire FET
To continue transistor downscaling beyond lateral 7nm devices, gate-all-around (GAA) junction-less vertical nanowire field effect transistors (VNWFET) represent a promising option. This invited paper presents the circuit design flow based on a vertical junctionless transistor technology. On the basis of state-of-the-art junctionless nanowire transistors (JLNT), DC characterization, compact modelling, EM simulation and parameter extraction are described in details. Using this circuit design flow, a set of innovative 3D circuit architectures are explored.
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