本征p沟道多晶硅薄膜晶体管扭结效应的简单模型

Mohammad. Jawaid Siddiqui, Samir Maqbool Al-Shariff, Abdur-Rahman F. AlMarshood
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引用次数: 0

摘要

为了改进多晶硅薄膜晶体管(Poly-Si-TFTs)的建模,需要对冲击电离产生的过量电流进行精确的评估。在本文中,我们提出了一个简单的模型,由高漏偏置时发生的冲击电离产生的过量电流。该模型基于通道饱和部分的电场估计。饱和区电场由二维泊松方程的解得到。该模型是半解析的,只使用一个拟合参数,适合于电路仿真。所建立的冲击电离电流模型的仿真结果与本征p沟道si - tft的实验输出特性非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Simple Model for the Kink Effect for the Intrinsic p-channel Polysilicon thin film transistors
In order to improve the modeling of polysilicon thin film transistors (Poly-Si-TFTs) a precise evaluation of the excess current due to impact ionization is needed. In this paper, we have proposed a simple model for the excess current resulting from the impact ionization occurring at high drain biases. Model is based on the estimation of the electric field in the saturated part of the channel. The electric field in the saturated region is obtained by the solution of the two-dimensional Poisson's equation. The model is semi-analytical and uses only one fitting parameter which is desirable for circuit simulation. The simulation results with the developed impact ionization current model are in excellent agreement with the available experimental output characteristics of the intrinsic p-channel Poly-Si-TFTs.
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