T. Beatty, P. Hatch, R. Santiesteban, S. Taduri, B. Krantz, S. Melosky, D. Marshall, M. Ameen
{"title":"大电流大批量制造的粒子减少策略","authors":"T. Beatty, P. Hatch, R. Santiesteban, S. Taduri, B. Krantz, S. Melosky, D. Marshall, M. Ameen","doi":"10.1109/IIT.2002.1258003","DOIUrl":null,"url":null,"abstract":"The particle performance of high current implanters was studied in a wide variety of production environments and applications over a period exceeding two years. Equipment design, preventive maintenance and tool utilization were all found to play a critical role achieving particle levels < 0.10 particles/cm2 on a routine basis. Based on a parametric study of root causes, including detailed analysis of trend data and particle maps, beamline and endstation hardware was developed to address specific issues and optimize machine performance. A systematic method using six-sigma procedures, designed experiments, and SPC tools, is described for implementing procedural, software and hardware changes in a production environment. This methodology allowed us to demonstrate improvements in both equipment productivity and particle performance.","PeriodicalId":305062,"journal":{"name":"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on","volume":"2014 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Particle reduction strategies for high current-high volume manufacturing\",\"authors\":\"T. Beatty, P. Hatch, R. Santiesteban, S. Taduri, B. Krantz, S. Melosky, D. Marshall, M. Ameen\",\"doi\":\"10.1109/IIT.2002.1258003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The particle performance of high current implanters was studied in a wide variety of production environments and applications over a period exceeding two years. Equipment design, preventive maintenance and tool utilization were all found to play a critical role achieving particle levels < 0.10 particles/cm2 on a routine basis. Based on a parametric study of root causes, including detailed analysis of trend data and particle maps, beamline and endstation hardware was developed to address specific issues and optimize machine performance. A systematic method using six-sigma procedures, designed experiments, and SPC tools, is described for implementing procedural, software and hardware changes in a production environment. This methodology allowed us to demonstrate improvements in both equipment productivity and particle performance.\",\"PeriodicalId\":305062,\"journal\":{\"name\":\"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on\",\"volume\":\"2014 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IIT.2002.1258003\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIT.2002.1258003","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Particle reduction strategies for high current-high volume manufacturing
The particle performance of high current implanters was studied in a wide variety of production environments and applications over a period exceeding two years. Equipment design, preventive maintenance and tool utilization were all found to play a critical role achieving particle levels < 0.10 particles/cm2 on a routine basis. Based on a parametric study of root causes, including detailed analysis of trend data and particle maps, beamline and endstation hardware was developed to address specific issues and optimize machine performance. A systematic method using six-sigma procedures, designed experiments, and SPC tools, is described for implementing procedural, software and hardware changes in a production environment. This methodology allowed us to demonstrate improvements in both equipment productivity and particle performance.