{"title":"PICCO项目:一项调查","authors":"Richard M. De La Rue, T. Krauss","doi":"10.1109/ICTON.2002.1007830","DOIUrl":null,"url":null,"abstract":"This presentation will provide a limited overview of work carried out in the multi-partner PICCO (photonic integrated circuits by crystal optics) project. In particular, the III-V material system used in PICCO is the AlGaAs/GaAs material system. In the PICCO project, the approach used for lithographic pattern definition has been, so far, primarily the 'conventional' one, i.e. direct-write electron-beam lithography. But, at the outset, our recognition of the need for a genuinely mass-production approach has led to work on excimer-laser based photolithography, with high-precision masks giving a replicative approach.","PeriodicalId":126085,"journal":{"name":"Proceedings of 2002 4th International Conference on Transparent Optical Networks (IEEE Cat. No.02EX551)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"The PICCO project: a survey\",\"authors\":\"Richard M. De La Rue, T. Krauss\",\"doi\":\"10.1109/ICTON.2002.1007830\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This presentation will provide a limited overview of work carried out in the multi-partner PICCO (photonic integrated circuits by crystal optics) project. In particular, the III-V material system used in PICCO is the AlGaAs/GaAs material system. In the PICCO project, the approach used for lithographic pattern definition has been, so far, primarily the 'conventional' one, i.e. direct-write electron-beam lithography. But, at the outset, our recognition of the need for a genuinely mass-production approach has led to work on excimer-laser based photolithography, with high-precision masks giving a replicative approach.\",\"PeriodicalId\":126085,\"journal\":{\"name\":\"Proceedings of 2002 4th International Conference on Transparent Optical Networks (IEEE Cat. No.02EX551)\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-08-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of 2002 4th International Conference on Transparent Optical Networks (IEEE Cat. No.02EX551)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICTON.2002.1007830\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 2002 4th International Conference on Transparent Optical Networks (IEEE Cat. No.02EX551)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICTON.2002.1007830","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This presentation will provide a limited overview of work carried out in the multi-partner PICCO (photonic integrated circuits by crystal optics) project. In particular, the III-V material system used in PICCO is the AlGaAs/GaAs material system. In the PICCO project, the approach used for lithographic pattern definition has been, so far, primarily the 'conventional' one, i.e. direct-write electron-beam lithography. But, at the outset, our recognition of the need for a genuinely mass-production approach has led to work on excimer-laser based photolithography, with high-precision masks giving a replicative approach.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
