光照明InP太赫兹冲击器件

Nilratan Mazumder
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引用次数: 3

摘要

通过仿真实验研究了工作在0.3 THz区域的磷化铟(InP)双漂移IMPATT二极管的动态特性。研究表明,InP IMPATT能够在0.3太赫兹以10%的效率产生高射频功率(41.7 mW)。然而,寄生串联电阻被发现产生3.0%的负电导和二极管的射频功率降低。通过研究饱和电流增强对IMPATT器件太赫兹频率性能的影响,探讨了光照对器件的影响。为此,采用了一种改进的双迭代模拟技术。研究发现,随着饱和电流的增大,器件的负电导和负电阻减小,工作频率和器件质量因数上升。当器件性能由空穴饱和电流控制时,工作频率的上升幅度比由电子主导的饱和电流控制时要大(30 GHz)。发现半导体中电子和空穴电离率的大小与上述效应相关。这些结果表明,即使在太赫兹频率范围内,InP DDR IMPATT二极管也具有高度的光敏性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photo-Illuminated InP Terahertz IMPATT Device
The dynamic properties of indium phosphide (InP) double drift IMPATT diode operating at 0.3 THz region are studied through a simulation experiment. The study indicates that InP IMPATT is capable of generating high RF power (41.7 mW) at 0.3 terahertz with 10% efficiency. However, the parasitic series resistance is found to produce a 3.0% reduction in the negative conductance and the RF power of the diode. The effect of photo-illumination on the device is also investigated by studying the role of enhanced saturation current on the THz frequency performance of this IMPATT device. A modified double iterative simulation technique developed by the authors is used for this purpose. It is found that (i) the negative conductance and (ii) the negative resistance of the device decrease, while, the frequency of operation and the device quality factor shift upward with increasing saturation current. The upward shift in operating frequency is found to be more (30 GHz) when the device performance is controlled by the hole saturation current rather than by the electron dominated saturation current. The magnitudes of electron and hole ionization rates in the semiconductor have been found to be correlated with the above effect. These results thus indicate that InP DDR IMPATT diode is highly photo-sensitive even at THz range of frequencies.
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