7纳米FinFET技术镜面全加法器的SET缓解技术

Rafael N. M. Oliveira, F. A. D. Silva, Ricardo Reis, C. Meinhardt
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引用次数: 0

摘要

本文在考虑标称和近阈值操作的情况下,对使用7 nm节点的FinFET器件实现的镜面全加法器拓扑的辐射灵敏度和SET缓解技术进行了比较分析。所研究的缓解技术是去耦电池和晶体管尺寸。晶体管尺寸可以提高稳健性,最高可达$2\ mathm {x}$(标称),接近$3\ mathm {x}$(接近阈值)。结合这些技术,在标称操作中将总误差降低近60%,在近阈值操作中将误差降低34%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
SET Mitigation Techniques on Mirror Full Adder at 7 nm FinFET Technology
This paper presents a comparative analysis of radiation sensitivity and SET mitigation techniques for the Mirror Full Adder topology implemented with FinFET devices at 7 nm node, considering nominal and near-threshold operation. The mitigation techniques investigated are Decoupling Cells and Transistor Sizing. Transistor Sizing may improved robustness up to $2\mathrm{x}$ (nominal) and close to $3\mathrm{x}$ (near-threshold). Combining the techniques decreases the total error occurrence close to 60% at nominal operation and up to 34% at near-threshold operation.
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