物理吸附掺杂诱导石墨烯纳米结构中的多点行为

T. Iwasaki, Zhongwang Wang, J. Reynolds, M. Muruganathan, H. Mizuta
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引用次数: 0

摘要

我们报道了p掺杂/少掺杂石墨烯纳米缩窄结构中的单载流子输运特性。在掺杂石墨烯器件中,在5 K的电荷中性点(CNF)周围观察到重叠的库仑金刚石特性。通过退火还原石墨烯中的掺杂,在CNP周围的一定栅极电压范围内出现周期性峰。此外,还观察到非重叠的库仑金刚石特性。这些结果表明,通过降低掺杂浓度可以避免石墨烯纳米器件中无意的电荷岛形成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Physisorption doping induced multiple dots behavior in graphene nanoconstrictions
We report the single carrier transport properties in the p-doped/less-doped graphene nanoconstriction structures. In the doped graphene devices, the overlapped Coulomb diamond characteristics are observed around the charge neutrality point (CNF) at 5 K. Reducing doping in graphene by annealing, the periodic peaks appear in the certain gate voltage range around the CNP. Additionally, the non-overlapped Coulomb diamond characteristic is observed. These results suggest that unintentional charging island formation in graphene nanodevices can be avoided by decreasing the doping concentration.
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