导电氧化铟锡玻璃基板上类金刚石碳薄膜的电沉积

Ching-Tsang Chang, Yi-Tsung Chang, Yun-Jhung Chih, H. Ueng
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引用次数: 1

摘要

本文研究了在2.1V~120V电压下,在氧化铟锡(ITO)玻璃基板上电沉积类金刚石(DLC)薄膜,将不同比例的乙酸与去离子水混合,形成0.2~0.8%的电解溶液。结果表明,在沉积温度30°~65°、电压50V、电解溶液浓度0.8%的条件下,DLC薄膜的反射系数降至60%,理论匹配折射率为1.32。这一发现适用于各种光电子器件,如太阳能电池的保护层或窗口层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrodeposition of diamond-like carbon thin film on conductive indium-tin-oxide glass substrate
This paper presents electrodeposition of diamond-like carbon (DLC) thin film deposits on indium tin oxide (ITO) glass substrate under voltage 2.1V~120V with mixing varying acetic acids' portions with deionized water, forming 0.2~0.8% electrolytic solutions. The result shows that at deposition temperature 30°~65°, voltage 50V and 0.8% electrolytic solution concentration of DLC thin films, the reflection index reduced to 60%, and theoretical matching refractive index became 1.32. This finding is applicable on various optoelectronic device like protective or window layer of solar cell.
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