超高性能交错排列(“II型”)InP/GaAsSb/InP NpN dhbt

C.R. Bogonesi, M. Dvorak, O. Pitts, N. Matine, S. Watkins
{"title":"超高性能交错排列(“II型”)InP/GaAsSb/InP NpN dhbt","authors":"C.R. Bogonesi, M. Dvorak, O. Pitts, N. Matine, S. Watkins","doi":"10.1109/ICIPRM.2001.929010","DOIUrl":null,"url":null,"abstract":"Using a conventional emitter-up triple-mesa process, we have fabricated C-doped InP/GaAsSb/InP double heterojunction bipolar transistors (DHBTs) exhibiting both f/sub T/ and f/sub MAX/=300 GHz while maintaining a breakdown voltage BV/sub CEO/=6 V. Our devices feature stable and well-behaved common-emitter DC and RF characteristics up to J/sub C/=500 kA/cm/sup 2/ without any passivation nor heatsinking. InP/GaAsSb/InP abrupt junction DHBTs couple unprecedented performance to apparent manufacturability advantages which should enable applications well beyond 40 Gb/s and challenge InP HEMTs in the 80-100 Gb/s arena.","PeriodicalId":403484,"journal":{"name":"Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Ultrahigh performance staggered lineup (\\\"Type II\\\") InP/GaAsSb/InP NpN DHBTs\",\"authors\":\"C.R. Bogonesi, M. Dvorak, O. Pitts, N. Matine, S. Watkins\",\"doi\":\"10.1109/ICIPRM.2001.929010\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Using a conventional emitter-up triple-mesa process, we have fabricated C-doped InP/GaAsSb/InP double heterojunction bipolar transistors (DHBTs) exhibiting both f/sub T/ and f/sub MAX/=300 GHz while maintaining a breakdown voltage BV/sub CEO/=6 V. Our devices feature stable and well-behaved common-emitter DC and RF characteristics up to J/sub C/=500 kA/cm/sup 2/ without any passivation nor heatsinking. InP/GaAsSb/InP abrupt junction DHBTs couple unprecedented performance to apparent manufacturability advantages which should enable applications well beyond 40 Gb/s and challenge InP HEMTs in the 80-100 Gb/s arena.\",\"PeriodicalId\":403484,\"journal\":{\"name\":\"Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)\",\"volume\":\"14 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-05-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.2001.929010\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2001.929010","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

利用传统的发射源上三台工艺,我们制备了c掺杂InP/GaAsSb/InP双异质结双极晶体管(dhbt),其f/sub T/和f/sub MAX/=300 GHz,同时保持击穿电压BV/sub CEO/=6 V。我们的器件具有稳定且性能良好的共发射极DC和RF特性,最高可达J/sub C/=500 kA/cm/sup 2/,没有任何钝化或散热。InP/GaAsSb/InP突变结dhbt将前所未有的性能与明显的可制造性优势结合在一起,这将使应用远远超过40 Gb/s,并挑战80-100 Gb/s领域的InP hemt。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ultrahigh performance staggered lineup ("Type II") InP/GaAsSb/InP NpN DHBTs
Using a conventional emitter-up triple-mesa process, we have fabricated C-doped InP/GaAsSb/InP double heterojunction bipolar transistors (DHBTs) exhibiting both f/sub T/ and f/sub MAX/=300 GHz while maintaining a breakdown voltage BV/sub CEO/=6 V. Our devices feature stable and well-behaved common-emitter DC and RF characteristics up to J/sub C/=500 kA/cm/sup 2/ without any passivation nor heatsinking. InP/GaAsSb/InP abrupt junction DHBTs couple unprecedented performance to apparent manufacturability advantages which should enable applications well beyond 40 Gb/s and challenge InP HEMTs in the 80-100 Gb/s arena.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信