用于ka波段应用的高性能In0.52Al0.48As/In0.6Ga0.4As功率变质HEMT

Chia-Yuan Chang, E. Chang, Y. Lien, Y. Miyamoto, Szu-Hung Chen, L. Chu
{"title":"用于ka波段应用的高性能In0.52Al0.48As/In0.6Ga0.4As功率变质HEMT","authors":"Chia-Yuan Chang, E. Chang, Y. Lien, Y. Miyamoto, Szu-Hung Chen, L. Chu","doi":"10.1109/SMELEC.2006.381095","DOIUrl":null,"url":null,"abstract":"A 70-nm In0.52Al0.48As/In0.6Ga0.4 power MHEMT with double delta-doping was fabricated and evaluated. The device has a high transconductance of 827 mS/mni. The saturated drain-source current of the device is 890 niA/mm. A current gain cutoff frequency (fT) of 200 GHz and a maximum oscillation frequency (fmax ) of 300 GHz were achieved due to the nanometer gate length and the high Indium content in the channel. When measured at 32 GHz, the 4 times 40 mum device demonstrates a maximum output power of 14.5 dBm with PldB of 11.1 dBm and the power gain is 9.5 dB. The excellent DC and RF performance of the 70-nm MHEMT shows a great potential for Ka-band power applications.","PeriodicalId":136703,"journal":{"name":"2006 IEEE International Conference on Semiconductor Electronics","volume":"34 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"High-Performance In0.52Al0.48As/In0.6Ga0.4As Power Metamorphic HEMT for Ka-Band Applications\",\"authors\":\"Chia-Yuan Chang, E. Chang, Y. Lien, Y. Miyamoto, Szu-Hung Chen, L. Chu\",\"doi\":\"10.1109/SMELEC.2006.381095\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A 70-nm In0.52Al0.48As/In0.6Ga0.4 power MHEMT with double delta-doping was fabricated and evaluated. The device has a high transconductance of 827 mS/mni. The saturated drain-source current of the device is 890 niA/mm. A current gain cutoff frequency (fT) of 200 GHz and a maximum oscillation frequency (fmax ) of 300 GHz were achieved due to the nanometer gate length and the high Indium content in the channel. When measured at 32 GHz, the 4 times 40 mum device demonstrates a maximum output power of 14.5 dBm with PldB of 11.1 dBm and the power gain is 9.5 dB. The excellent DC and RF performance of the 70-nm MHEMT shows a great potential for Ka-band power applications.\",\"PeriodicalId\":136703,\"journal\":{\"name\":\"2006 IEEE International Conference on Semiconductor Electronics\",\"volume\":\"34 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 IEEE International Conference on Semiconductor Electronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMELEC.2006.381095\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE International Conference on Semiconductor Electronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMELEC.2006.381095","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

制备了双δ掺杂的70 nm In0.52Al0.48As/In0.6Ga0.4功率MHEMT并对其性能进行了评价。该器件具有827 mS/mni的高跨导。该器件的漏源饱和电流为890nia /mm。由于纳米栅极长度和通道中铟的高含量,实现了200 GHz的电流增益截止频率(fT)和300 GHz的最大振荡频率(fmax)。在32ghz下测量时,4倍40ma器件的最大输出功率为14.5 dBm, PldB为11.1 dBm,功率增益为9.5 dB。70纳米MHEMT具有优异的直流和射频性能,在ka波段功率应用中具有巨大的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-Performance In0.52Al0.48As/In0.6Ga0.4As Power Metamorphic HEMT for Ka-Band Applications
A 70-nm In0.52Al0.48As/In0.6Ga0.4 power MHEMT with double delta-doping was fabricated and evaluated. The device has a high transconductance of 827 mS/mni. The saturated drain-source current of the device is 890 niA/mm. A current gain cutoff frequency (fT) of 200 GHz and a maximum oscillation frequency (fmax ) of 300 GHz were achieved due to the nanometer gate length and the high Indium content in the channel. When measured at 32 GHz, the 4 times 40 mum device demonstrates a maximum output power of 14.5 dBm with PldB of 11.1 dBm and the power gain is 9.5 dB. The excellent DC and RF performance of the 70-nm MHEMT shows a great potential for Ka-band power applications.
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