J. Underwood, J. Gray, N. Shepherd, M. Caldwell, M. Neel, B. Darlington
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Advanced Process Monitoring and Control Methods for Poly Gate CD Targeting
Accurate poly critical dimension (CD) control is necessary to run speed-sensitive parts in high volume production. A source-of-variation study indicated that poly CD variation accounted for over 50% of end-of-line variation in speed and power for a critical production part. A team was established to implement process control methodologies to reduce poly CD variation. The team took a module-based approach - linking outputs from the lithography, etch, and implant areas to form the tightest possible control for optimal product performance
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