3 ghz BAW复合谐振器集成CMOS在单芯片配置

Gayathri Pillai, A. Zope, J. M. Tsai, Sheng-Shian Li
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引用次数: 3

摘要

本文介绍了采用InvenSense AlN-MEMS + CMOS专有工艺制造的硅基复合氮化铝体声波谐振器(c-FBAR)的设计和表征。制作了高性能五边形谐振器,并在高阶厚度扩展模式下工作,在3.26 GHz时机电耦合系数为2.21%,卸载品质因子为~ 1933。在GHz工作频率范围内,进行了详细的去嵌入以去除会降低谐振器性能的寄生元件。去嵌入后,记录运动阻力1.5 Ω。这样的InvenSense平台使我们能够实现MEMS + CMOS集成系统,其中基于逆变器的皮尔斯振荡器在1.1V偏置下的功耗为0.5 mW。然而,MEMS谐振器的性能不足阻碍了振荡器的实现。电路的有效面积为55×85 μm2,整个CMOS-MEMS集成面积约为300×250 μm2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
3-GHz BAW composite resonators integrated with CMOS in a single-chip configuration
This work presents the design and characterization for composite Aluminum Nitride on Silicon based thin Film Bulk Acoustic Wave Resonators (c-FBAR) fabricated using a proprietary InvenSense AlN-MEMS + CMOS process. High performance pentagon shaped resonators are fabricated and operated under a high-order thickness-extensional mode with an electromechanical coupling coefficient of 2.21% and an unloaded quality factor of ~1,933 at 3.26 GHz. Detailed de-embedding is performed to remove the parasitic elements which would degrade the resonator performance in the GHz operational frequency range. After de-embedding, motional resistance of 1.5 Ω is recorded. Such an InvenSense platform allows us to realize MEMS + CMOS integrated systems where an inverter based Pierce oscillator with power consumption of 0.5 mW at 1.1V bias is designed. However, insufficient performance of the MEMS resonator impedes the oscillator implementation. The circuit has an active area of 55×85 μm2 and overall CMOS-MEMS integrated area is about 300×250 μm2.
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