砷化镓器件和集成电路中的辐射效应

W. Anderson, S. Binari
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引用次数: 5

摘要

本文对砷化镓器件和集成电路中的辐射效应进行了综述。它是卫星电子的一个重要领域,因为砷化镓在辐射硬度方面比硅有一些优势。本文讨论了过去在不同感兴趣的砷化镓器件上所做的测量,瞬态辐射和总剂量在阈值水平(辐射效应首先可检测到)和扰动水平(影响如此之大以至于阻止正常操作,例如,在记忆单元中,1或0的损失)方面的影响。重点是在瞬态辐射效应方面的最新成果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Radiation Effects in GaAs Devices and ICs
This paper is a review of radiation effects in GaAs devices and IC's. It is an important area in satellite electronics because GaAs has some advantages over Si in terms of radiation hardness. The paper discusses what measurements have been made in the past on the different GaAs devices of interest, the effects of transient radiation and total dose in terms of threshold levels (where the radiation effect is first detectable) and upset levels (where the effect is so large that normal operation is prevented, e.g., in a memory cell, loss of a 1 or 0. The emphasis is on recent results in transient radiation effects.
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