脉冲激光沉积LiNbO/sub - 3/和LiTaO/sub - 3/薄膜的SAW性能

Y. Shibata, N. Kuze, M. Matsui, K. Kaya, M. Kanai, T. Kawai
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引用次数: 1

摘要

采用Ar-F准分子激光烧蚀技术在蓝宝石和AlN/蓝宝石衬底上制备了LiNbO/ sub3 /和LiTaO/ sub3 /薄膜。系统地研究了薄膜的沉积和结构。利用x射线极位图、高分辨率x射线衍射和透射电镜对膜的结构进行了分析。分析结果表明,沉积的薄膜是高质量的外延薄膜。生长的LiNbO/sub 3/和LiTaO/sub 3/薄膜具有足够的压电性来制造SAW器件。SAW速度(Vs)和机电耦合系数(k/sup 2/)的实验数据与计算值基本吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
SAW properties of LiNbO/sub 3/ and LiTaO/sub 3/ films grown by pulsed laser deposition
LiNbO/sub 3/ and LiTaO/sub 3/ films are deposited on sapphire and AlN/sapphire substrates using Ar-F excimer laser ablation. The deposition and structure of the films are investigated systematically. The structure of the films is analyzed by X-ray pole figure, high-resolution X-ray diffraction and transmission electron microscopy. The results of these analysis indicate that deposited films are extremely high-quality epitaxial films. As-grown LiNbO/sub 3/ and LiTaO/sub 3/ films are sufficiently piezoelectric to fabricate SAW devices. The experimental data of SAW velocity (Vs) and electromechanical coupling coefficients (k/sup 2/) almost coincide with the calculated data.
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