金合金的电沉积及其力学性能

Haochun Tang, T. Chang, Chun-Yi Chen, T. Nagoshi, D. Yamane, T. Konishi, K. Machida
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引用次数: 2

摘要

根据固溶强化机理,电沉积金基材料通过与铜合金化实现强化。施加的电流密度对合金的组成有影响。通过微压缩测试来评估微尺度下的力学性能,以考虑微元件在MEMS器件中的应用的样本尺寸效应。恒流电沉积Au-Cu薄膜制备的微柱屈服强度达到1.15 GPa,薄膜的Cu含量为30.3 at%,平均晶粒尺寸为5.3 nm。采用脉冲电流电沉积方法,合金的屈服强度进一步提高到1.50 GPa, Cu浓度为36.9% at%,平均晶粒尺寸为4.4 nm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrodeposition of Gold Alloys and the Mechanical Properties
Strengthening of electrodeposited gold-based materials is achieved by alloying with copper according to the solid solution strengthening mechanism. Composition of the Au–Cu alloys is affected by the applied current density. The mechanical properties are evaluated by micro-compression tests to evaluate the mechanical properties in microscale to take consideration of the sample size effect for applications as microcomponents in MEMS devices. The yield strength reaches 1.15 GPa for the micropillar fabricated from constant current electrodeposited Au–Cu film, and the film is composed of 30.3 at% Cu with an average grain size of 5.3 nm. The yield strength further increases to 1.50 GPa when pulse current electrodeposition method is applied, and the Cu concentration is 36.9 at% with the average grain size at 4.4 nm.
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