受n-p-n泄漏扩散电流限制的DMOS FBSOA分析与建模

M. Denison, M. Pfost, M. Stecher, D. Silber
{"title":"受n-p-n泄漏扩散电流限制的DMOS FBSOA分析与建模","authors":"M. Denison, M. Pfost, M. Stecher, D. Silber","doi":"10.1109/ISPSD.2005.1488018","DOIUrl":null,"url":null,"abstract":"Failure of DMOS self-heated in saturation below the avalanche threshold is usually related to an activation of the parasitic n-p-n transistor. In this work we show that the exponential increase of the leakage diffusion current of the n-p-n is sufficient to cause thermal runaway, even for a slightly reverse body-source bias caused by the internal ballasting source resistance. Adding this current contribution to a basic DMOS compact model allows simulating the thermal limit of large DMOS transistors considered as distributed electrothermal networks. To our knowledge it is the first report of a quantitative DMOS FBSOA model accounting for the instabilities driven by the temperature dependences of both MOS and n-p-n components","PeriodicalId":154808,"journal":{"name":"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.","volume":"6 1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"17","resultStr":"{\"title\":\"Analysis and modeling of DMOS FBSOA limited by n-p-n leakage diffusion current\",\"authors\":\"M. Denison, M. Pfost, M. Stecher, D. Silber\",\"doi\":\"10.1109/ISPSD.2005.1488018\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Failure of DMOS self-heated in saturation below the avalanche threshold is usually related to an activation of the parasitic n-p-n transistor. In this work we show that the exponential increase of the leakage diffusion current of the n-p-n is sufficient to cause thermal runaway, even for a slightly reverse body-source bias caused by the internal ballasting source resistance. Adding this current contribution to a basic DMOS compact model allows simulating the thermal limit of large DMOS transistors considered as distributed electrothermal networks. To our knowledge it is the first report of a quantitative DMOS FBSOA model accounting for the instabilities driven by the temperature dependences of both MOS and n-p-n components\",\"PeriodicalId\":154808,\"journal\":{\"name\":\"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.\",\"volume\":\"6 1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-05-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"17\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.2005.1488018\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2005.1488018","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 17

摘要

在低于雪崩阈值的饱和状态下,DMOS自热失效通常与寄生n-p-n晶体管的激活有关。在这项工作中,我们证明了n-p-n的泄漏扩散电流的指数增长足以引起热失控,即使是由内部镇流器源电阻引起的稍微相反的体源偏置。将这种电流贡献添加到基本DMOS紧凑模型中,可以模拟被认为是分布式电热网络的大型DMOS晶体管的热极限。据我们所知,这是第一个定量DMOS FBSOA模型的报告,该模型考虑了MOS和n-p-n组件的温度依赖性驱动的不稳定性
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis and modeling of DMOS FBSOA limited by n-p-n leakage diffusion current
Failure of DMOS self-heated in saturation below the avalanche threshold is usually related to an activation of the parasitic n-p-n transistor. In this work we show that the exponential increase of the leakage diffusion current of the n-p-n is sufficient to cause thermal runaway, even for a slightly reverse body-source bias caused by the internal ballasting source resistance. Adding this current contribution to a basic DMOS compact model allows simulating the thermal limit of large DMOS transistors considered as distributed electrothermal networks. To our knowledge it is the first report of a quantitative DMOS FBSOA model accounting for the instabilities driven by the temperature dependences of both MOS and n-p-n components
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