蒸汽室中的滴状冷凝

R. Bonner
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引用次数: 12

摘要

电子设备的尺寸继续缩小,同时散发更多的热量。除去这些热量所需的风冷散热器的尺寸增加了,而热源的尺寸减小了。这些趋势导致了散热器底部的大传导梯度,导致热性能下降。减少风冷散热器扩散阻力的一种被动可靠的方法是在散热器底部嵌入一个蒸汽室。蒸汽室是一种两相传热装置,它利用毛细管力在饱和条件下等温循环工作流体。如果所述蒸汽室是适当的循环流体(在其毛细管极限内),则所述蒸汽室的热阻受所述蒸汽室中的蒸发和冷凝过程的限制。蒸发过程的热流密度通常比冷凝过程的热流密度高许多倍,因此蒸发过程受到了广泛的关注。然而,蒸汽室冷凝区的热流已经上升到不能忽视的程度。本文描述了一种通过使用自组装单层来促进滴状冷凝来改善蒸汽室装置中冷凝性能的新方法。在其他应用中,水滴状冷凝已被证明比在蒸汽室中发现的典型的膜状冷凝表面提高了一个数量级的冷凝传热系数。这里给出了比较蒸汽室中膜状和滴状冷凝表面性能的冷凝试验数据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dropwise condensation in vapor chambers
Electronic devices continue to shrink in size while dissipating more heat. The size of the air cooled heat sinks required to remove this heat has increased while the size of the heat source has decreased. These trends have resulted in large conduction gradients across the base of the heat sinks, resulting in decreased thermal performance. A passive and reliable method of minimizing the spreading resistance in air cooled heat sinks is to embed a vapor chamber in the base of the heat sink. A vapor chamber is a two-phase heat transfer device that uses capillary forces to isothermally circulate a working fluid at saturated conditions. Provided that the vapor chamber is circulating fluid properly (within its capillary limit) the thermal resistance of the vapor chamber is limited by the evaporating and condensing processes in the vapor chamber. Much attention has been paid to the evaporating process since the heat flux of the evaporating process is generally many times higher than that of the condensing process. However, heat fluxes in the condensing regions of vapor chambers have risen to the point where they can't be neglected. Described here is a novel method of improving the condensation performance in vapor chamber devices by using self-assembled monolayers to promote dropwise condensation. In other applications, dropwise condensation has been shown to improve the condensation heat transfer coefficient by an order of magnitude over the typical filmwise condensation surfaces found in vapor chambers. Presented here are condensation test data comparing the performance of filmwise and dropwise condensation surfaces in vapor chambers.
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