在200 ~ 420℃/spl温度下生长和退火的MBE GaAs层的电导特性

P. Kordos, J. Betkó, M. Morvic, J. Novák, A. Forster
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引用次数: 4

摘要

进行了精确的温度相关电导率测量,并确定了电导率的室温带和跳变分量,用于生长和退火(590/spl℃,10分钟)在200至420/spl℃之间的不同温度下生长的MBE GaAs层。随着生长温度的升高,跳变电导率显著降低,能带电导率略有变化。随着生长温度从200 /spl℃升高到420/spl℃,未生长层的/spl sigma//sub hop/与/spl sigma//sub band/比值从1/spl倍/10/sup 6/降低到2/spl倍/10/sup -2/,退火层的/spl倍/10/sup -3/从2/spl倍/10/sup 2/降低到2/spl倍/10/sup -3/。在400/spl℃下生长的未退火层和在350/spl℃下生长的退火层的能带和跳波分量相当。在<350/spl℃条件下生长的层在生长状态下晶格失配。进一步发现,占主导跳变的层与占主导带电导的层表现出不同的电击穿特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Conductance properties of as-grown and annealed MBE GaAs layers grown at temperatures between 200 and 420/spl deg/C
Precise temperature dependent conductivity measurements are carried out and the room temperature band and hopping components of the conductivity are determined for as-grown and annealed (590/spl deg/C, 10 min) MBE GaAs layers grown at various temperatures between 200 and 420/spl deg/C. It is found that the hopping conductivity strongly decreases and the band conductivity slightly changes with increasing growth temperature. The /spl sigma//sub hop/ to /spl sigma//sub band/ ratio decreases from 1/spl times/10/sup 6/ to 2/spl times/10/sup -2/ in as-grown layers and from 2/spl times/10/sup 2/ to 2/spl times/10/sup -3/ in annealed layers with increased growth temperature from 200 to 420/spl deg/C. The band and hopping components are comparable for unannealed layer grown at 400/spl deg/C and annealed layer grown at 350/spl deg/C. Layers grown at <350/spl deg/C are lattice mismatched in as-grown state. Further it is found that layers with dominating hopping show different electrical breakdown properties than layers with dominating band conductance.
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