mosfet中的可逆通道电流效应

O. Huerta-G., E. Gutiérrez-D.
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引用次数: 0

摘要

介绍了28nm nMOSFET中源极-漏极和漏极-源极可逆通道电流的实验结果。通过数值模拟,我们发现可以用密度梯度(DG)理论来理解可逆通道电流,该理论通过广义量子势沿通道梯度的符号变化来解释可逆电流。该效应仅在低漏极电压下观察到,当栅极电压从低值扫向高值时,轻微的初始内部沟道电导(无偏置)不平衡导致沟道电流反转。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A reversible channel current effect in MOSFETs
A set of experimental results showing a source-to-drain and drain-to-source reversible channel current in a 28 nm nMOSFET is introduced. By numerical modeling we found out that the reversible channel current is understood bY incorporating the Density Gradient (DG) theory, which explains the reversible current by a change of sign in the gradient of the generalized quantum potential along the channel. The effect is only observable at low drain voltages, where a slight initial internal channel conductance (at no bias) unbalance causes the channel current to reverse when the gate voltage sweeps from low to high values.
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