Hong Yang, Hong Wang, G. Ng, Haiqun Zheng, K. Radhakrishnan
{"title":"高温下高增益变质InP/InGaAs异质结双极晶体管的器件性能和输运特性","authors":"Hong Yang, Hong Wang, G. Ng, Haiqun Zheng, K. Radhakrishnan","doi":"10.1109/ICIPRM.2001.929092","DOIUrl":null,"url":null,"abstract":"A detailed DC characterization of metamorphic InP/InGaAs/InP DHBT's in the temperature range of 300 K to 400 K was carried out and the carrier transport properties were investigated. Our experiments reveal that band-to-band recombination is the dominant mechanism for the base current indicating the good base material quality for the metamorphic HBT structures.","PeriodicalId":403484,"journal":{"name":"Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Device performance and transport properties of high gain metamorphic InP/InGaAs heterojunction bipolar transistors at elevated temperature\",\"authors\":\"Hong Yang, Hong Wang, G. Ng, Haiqun Zheng, K. Radhakrishnan\",\"doi\":\"10.1109/ICIPRM.2001.929092\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A detailed DC characterization of metamorphic InP/InGaAs/InP DHBT's in the temperature range of 300 K to 400 K was carried out and the carrier transport properties were investigated. Our experiments reveal that band-to-band recombination is the dominant mechanism for the base current indicating the good base material quality for the metamorphic HBT structures.\",\"PeriodicalId\":403484,\"journal\":{\"name\":\"Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-05-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.2001.929092\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Proceedings. 2001 International Conference on Indium Phosphide and Related Materials. 13th IPRM (Cat. No.01CH37198)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2001.929092","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Device performance and transport properties of high gain metamorphic InP/InGaAs heterojunction bipolar transistors at elevated temperature
A detailed DC characterization of metamorphic InP/InGaAs/InP DHBT's in the temperature range of 300 K to 400 K was carried out and the carrier transport properties were investigated. Our experiments reveal that band-to-band recombination is the dominant mechanism for the base current indicating the good base material quality for the metamorphic HBT structures.