发射电子形成MIM结构Mo-SiO/sub - 2/-Al与一层聚丙烯

2005 International Vacuum Nanoelectronics Conference Pub Date : 2005-07-10 DOI:10.1109/IVNC.2005.1619548

T. Pavel, S. Juriy, G. Serge

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引用次数: 0

摘要

金属-绝缘体-金属(MIM)结构和金属-绝缘体-半导体(MIS)结构广泛应用于各种微电子器件中。薄膜结构，服从于电成形过程，被广泛地研究，与它们在平板显示器中作为电子源的使用机会有关。

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Emission of electrons from form MIM structure Mo-SiO/sub 2/-Al with a layer of polypropylene

The structures of metal-insulator-metal (MIM) and metal-insulator-semiconductor (MIS) are widely applied in various devices of microelectronics. The thin-film structures, subject to process of electrical forming, are widely investigated in connection with an opportunity of their use in flat panel displays as a source of electrons.

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2005 International Vacuum Nanoelectronics Conference

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