使用生产测试数据进行污染控制

Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future' Pub Date : 1995-10-02 DOI:10.1109/IEMT.1995.526095

Young-Jun Kwon, D. Walker

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引用次数: 3

摘要

本文提出了一种方法，通过利用生产功能测试结果来识别IC制造线斜坡和成熟期间的可疑工艺步骤，并生成缺陷帕累托以优先考虑缺陷污染控制。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Contamination control using production test data

This paper presents a methodology to identify suspect process steps during ramp and maturity of an IC fabrication line by utilizing the production functional testing results and to generate a defect Pareto to prioritize defect contamination control.

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来源期刊

Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'

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