Γ-X通过单一屏障的隧道传输

D. Landheer, H. Liu, M. Buchanan, R. Stoner
{"title":"Γ-X通过单一屏障的隧道传输","authors":"D. Landheer, H. Liu, M. Buchanan, R. Stoner","doi":"10.1364/qwoe.1989.tud2","DOIUrl":null,"url":null,"abstract":"When electrons tunnel through a single barrier of AlAs between GaAs contact layers there is a possibility of transfer from the Γ-conduction band to the X-band.1,2,3 The basic mechanism for Γ-X transfer based on the model of Liu 3 is shown in Fig. 1 along with Γ (solid lines) and X (dashed lines) conduction-band profiles for a 5.2 nm AlAs barrier. A Γ-electron can (1) tunnel through the entire structure without transfer, it can (2) transfer to the X-minimum at the first interface and propagate through the AlAs layer before transferring back to the Γ-minimum, or it can (3) transfer to the X-minimum at the first interface and propagate through the whole structure. The transfer at the interfaces is described by an interaction vertex VΓX or a coupling parameter α as described in Ref. 3. The process (2) is relatively unimportant at low applied potentials but becomes dominant above about 0.3 V where the Fermi energy has crossed the X-band in the AlAs.","PeriodicalId":205579,"journal":{"name":"Quantum Wells for Optics and Optoelectronics","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Γ-X Transfer in Tunneling through Single AlAs Barriers\",\"authors\":\"D. Landheer, H. Liu, M. Buchanan, R. Stoner\",\"doi\":\"10.1364/qwoe.1989.tud2\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"When electrons tunnel through a single barrier of AlAs between GaAs contact layers there is a possibility of transfer from the Γ-conduction band to the X-band.1,2,3 The basic mechanism for Γ-X transfer based on the model of Liu 3 is shown in Fig. 1 along with Γ (solid lines) and X (dashed lines) conduction-band profiles for a 5.2 nm AlAs barrier. A Γ-electron can (1) tunnel through the entire structure without transfer, it can (2) transfer to the X-minimum at the first interface and propagate through the AlAs layer before transferring back to the Γ-minimum, or it can (3) transfer to the X-minimum at the first interface and propagate through the whole structure. The transfer at the interfaces is described by an interaction vertex VΓX or a coupling parameter α as described in Ref. 3. The process (2) is relatively unimportant at low applied potentials but becomes dominant above about 0.3 V where the Fermi energy has crossed the X-band in the AlAs.\",\"PeriodicalId\":205579,\"journal\":{\"name\":\"Quantum Wells for Optics and Optoelectronics\",\"volume\":\"32 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Quantum Wells for Optics and Optoelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/qwoe.1989.tud2\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Quantum Wells for Optics and Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/qwoe.1989.tud2","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

当电子隧穿砷化镓接触层之间的单一势垒时,有可能从Γ-conduction波段转移到x波段。基于Liu 3模型的Γ-X转移的基本机制如图1所示,以及5.2 nm AlAs势垒的Γ(实线)和X(虚线)导带分布图。Γ-electron可以(1)在不传输的情况下隧道穿过整个结构,也可以(2)在第一个接口上传输到X-minimum并通过AlAs层传播后再传输回Γ-minimum,或者(3)在第一个接口上传输到X-minimum并传播到整个结构。界面上的传递由相互作用顶点VΓX或耦合参数α描述,如文献3所述。在较低的施加电位下,过程(2)相对不重要,但在0.3 V以上,当费米能量越过阿拉斯的x波段时,过程(2)就变得占主导地位。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Γ-X Transfer in Tunneling through Single AlAs Barriers
When electrons tunnel through a single barrier of AlAs between GaAs contact layers there is a possibility of transfer from the Γ-conduction band to the X-band.1,2,3 The basic mechanism for Γ-X transfer based on the model of Liu 3 is shown in Fig. 1 along with Γ (solid lines) and X (dashed lines) conduction-band profiles for a 5.2 nm AlAs barrier. A Γ-electron can (1) tunnel through the entire structure without transfer, it can (2) transfer to the X-minimum at the first interface and propagate through the AlAs layer before transferring back to the Γ-minimum, or it can (3) transfer to the X-minimum at the first interface and propagate through the whole structure. The transfer at the interfaces is described by an interaction vertex VΓX or a coupling parameter α as described in Ref. 3. The process (2) is relatively unimportant at low applied potentials but becomes dominant above about 0.3 V where the Fermi energy has crossed the X-band in the AlAs.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信