表面成像抗蚀剂:承诺、实践和前景

Extreme Ultraviolet Lithography (TOPS) Pub Date : 1900-01-01 DOI:10.1364/eul.1996.r28

M. Hanratty

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引用次数: 0

摘要

表面成像技术有潜力提供更高的分辨率，更大的工艺纬度和扩展光学光刻工具的能力。表面成像抗蚀剂(SIR)以DESIRE工艺的形式在德州仪器已经使用了一段时间。它最初是为g线曝光工具(436纳米)开发的，现在被用于推动248纳米DUV步进器的功能。本文综述了SIR的优点，介绍了SIR的应用现状，并对其应用前景进行了展望。

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Surface Imaging Resists: Promises, Practices and Prospects

Surface imaging technology has the potential of providing enhanced resolution, larger process latitude and extending the capabilities of optical lithography tools. Surface imaging resist (SIR) processing in the form of the DESIRE process has been used at Texas Instruments for some time. Originally developed for g-line exposure tools (436 nm), it is now being used to push the capabilities of a 248 nm DUV stepper. In this paper the advantages of SIR are reviewed, the current practices described, and prospects for the future applications discussed.

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Extreme Ultraviolet Lithography (TOPS)

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