低温生长MBE GaAs中少数载流子结构与寿命的关系

Z. Liliental-Weber, S. Gupta, F. Smith
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引用次数: 0

摘要

确定了低温(LT) GaAs层的结构质量与少数载流子寿命的关系。本研究采用了RHEED、透射电子显微镜(TEM)、时间分辨反射法和光导开关响应测量。在As长大的层中已经发现了亚皮秒的少数载流子寿命,并且在层退火和As沉淀形成后该值没有变化。研究发现,这些层的响应性在很大程度上取决于层的结构质量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Relation between structure and lifetime of minority carriers -in MBE GaAs grown at low temperatures
The relation between the structural quality of low-temperature (LT) GaAs layers and minority carrier lifetime was determined. RHEED, transmission electron microscopy (TEM), time resolved reflectance methods, and photoconductive switch response measurements were used for this study. Subpicosecond minority carrier lifetimes were found already in as-grown layers, and this value did not change after annealing of the layers and formation of As precipitates. It was found that the responsivity of these layers depends strongly on the structural quality of the layers.
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