v波段LC-VCO在65nm SOI CMOS中的工艺可变性

D.D. Kim, Jonghae Kim, Choongyeun Cho
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引用次数: 2

摘要

研究了在65nm SOI CMOS中实现的v波段LC-VCO的工艺变异性。一个互补的LC-VCO设计,测试设置,并提出了测量。对一批300mm晶圆进行了测量统计。这批有8片晶圆,每片有67个vco。分析和讨论了压控振荡器的频率调谐范围统计、数字基准的模拟变异性、良率估计以及晶圆内与晶圆间的变化。VCO的平均调谐频率为63.7 ~ 69.6 GHz,在65.1 ~ 67.9 GHz范围内显示90%的良率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The process variability of a V-band LC-VCO in 65nm SOI CMOS
The process variability of a V-band LC-VCO implemented in 65 nm SOI CMOS is examined. A complementary LC-VCO design, test set up, and measurements are presented. One lot of 300 mm wafers are measured for statistics. There are 8 wafers in the lot, and 67 VCOs per wafer. The VCO frequency tuning range statistics, analog variability against digital benchmark, yield estimation, and intra- vs. inter-wafer variations are analyzed and discussed. The VCO average frequency tuning is 63.7-69.6 GHz, and it shows 90% yield from 65.1 to 67.9 GHz.
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