从耦合霍尔迁移率测量和理论建模确定石墨烯和衬底质量

Karolina Japec, M. Matić, R. Lukošė, M. Lisker, M. Lukosius, M. Poljak
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引用次数: 0

摘要

在40 K至300 K的温度范围内,通过霍尔棒表征,石墨烯的迁移率增加了~2600 cm2/Vs。采用基于玻尔兹曼输运方程的动量松弛时间近似的理论建模,将这种增加趋势归因于库仑散射。我们还发现,在室温和较高的电荷密度下,晶格缺陷和/或衬底波纹散射等附加机制变得重要,并将迁移率限制在~200 cm2/Vs,载流子平均自由程远低于~35nm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Determining Graphene and Substrate Quality from the Coupled Hall Mobility Measurements and Theoretical Modeling
An increase of mobility up to ~2600 cm2/Vs is observed in graphene by Hall bar characterization within the temperature range from 40 K to 300 K. The increasing trend is attributed to Coulomb scattering by employing theoretical modeling based on the momentum relaxation time approximation of the Boltzmann transport equation. We also find that at room temperature and for higher charge densities additional mechanisms such as lattice defect and/or substrate corrugation scattering become important and restrict the mobility down to only ~200 cm2/Vs and carrier mean free paths well under ~35nm.
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