Karolina Japec, M. Matić, R. Lukošė, M. Lisker, M. Lukosius, M. Poljak
{"title":"从耦合霍尔迁移率测量和理论建模确定石墨烯和衬底质量","authors":"Karolina Japec, M. Matić, R. Lukošė, M. Lisker, M. Lukosius, M. Poljak","doi":"10.23919/MIPRO57284.2023.10159692","DOIUrl":null,"url":null,"abstract":"An increase of mobility up to ~2600 cm2/Vs is observed in graphene by Hall bar characterization within the temperature range from 40 K to 300 K. The increasing trend is attributed to Coulomb scattering by employing theoretical modeling based on the momentum relaxation time approximation of the Boltzmann transport equation. We also find that at room temperature and for higher charge densities additional mechanisms such as lattice defect and/or substrate corrugation scattering become important and restrict the mobility down to only ~200 cm2/Vs and carrier mean free paths well under ~35nm.","PeriodicalId":177983,"journal":{"name":"2023 46th MIPRO ICT and Electronics Convention (MIPRO)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Determining Graphene and Substrate Quality from the Coupled Hall Mobility Measurements and Theoretical Modeling\",\"authors\":\"Karolina Japec, M. Matić, R. Lukošė, M. Lisker, M. Lukosius, M. Poljak\",\"doi\":\"10.23919/MIPRO57284.2023.10159692\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An increase of mobility up to ~2600 cm2/Vs is observed in graphene by Hall bar characterization within the temperature range from 40 K to 300 K. The increasing trend is attributed to Coulomb scattering by employing theoretical modeling based on the momentum relaxation time approximation of the Boltzmann transport equation. We also find that at room temperature and for higher charge densities additional mechanisms such as lattice defect and/or substrate corrugation scattering become important and restrict the mobility down to only ~200 cm2/Vs and carrier mean free paths well under ~35nm.\",\"PeriodicalId\":177983,\"journal\":{\"name\":\"2023 46th MIPRO ICT and Electronics Convention (MIPRO)\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-05-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 46th MIPRO ICT and Electronics Convention (MIPRO)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/MIPRO57284.2023.10159692\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 46th MIPRO ICT and Electronics Convention (MIPRO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/MIPRO57284.2023.10159692","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Determining Graphene and Substrate Quality from the Coupled Hall Mobility Measurements and Theoretical Modeling
An increase of mobility up to ~2600 cm2/Vs is observed in graphene by Hall bar characterization within the temperature range from 40 K to 300 K. The increasing trend is attributed to Coulomb scattering by employing theoretical modeling based on the momentum relaxation time approximation of the Boltzmann transport equation. We also find that at room temperature and for higher charge densities additional mechanisms such as lattice defect and/or substrate corrugation scattering become important and restrict the mobility down to only ~200 cm2/Vs and carrier mean free paths well under ~35nm.