AlGaAs/GaAs异质结构中量子霍尔效应的最新测量以获得电阻标准

F. Hernandez-Marquez, Z. Rivera-Alvarez, A. Guillén, J. Huerta-Ruelas, I. Hernández, V. Méndez-García, M. López-López
{"title":"AlGaAs/GaAs异质结构中量子霍尔效应的最新测量以获得电阻标准","authors":"F. Hernandez-Marquez, Z. Rivera-Alvarez, A. Guillén, J. Huerta-Ruelas, I. Hernández, V. Méndez-García, M. López-López","doi":"10.1109/ICEEE.2006.251902","DOIUrl":null,"url":null,"abstract":"In the last few years we have been working in order to obtain a resistance standard using the quantum hall effect (QHE). Several AlGaAs/GaAs structures and a variety of ohmic contacts procedures have been evaluated to achieve devices with metrological quality. Recently we have obtained devices with the following characteristics: the resistance plateau corresponding to the quantum number i=2 is obtained for a magnetic flux density in the order of 7 T at 1.3 K, the residual value of the longitudinal resistance is 107 muOmega for a current of 50 muA. These characteristics are comparable with those obtained in QHE devices used at Centro Nacional de Metrologia (CENAM). Such results show that the developed devices have the quality required for reference standard DC resistance measurements","PeriodicalId":125310,"journal":{"name":"2006 3rd International Conference on Electrical and Electronics Engineering","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Recent measurements of the Quantum Hall Effect in AlGaAs/GaAs Heterostructures to Obtain a Resistance Standard\",\"authors\":\"F. Hernandez-Marquez, Z. Rivera-Alvarez, A. Guillén, J. Huerta-Ruelas, I. Hernández, V. Méndez-García, M. López-López\",\"doi\":\"10.1109/ICEEE.2006.251902\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In the last few years we have been working in order to obtain a resistance standard using the quantum hall effect (QHE). Several AlGaAs/GaAs structures and a variety of ohmic contacts procedures have been evaluated to achieve devices with metrological quality. Recently we have obtained devices with the following characteristics: the resistance plateau corresponding to the quantum number i=2 is obtained for a magnetic flux density in the order of 7 T at 1.3 K, the residual value of the longitudinal resistance is 107 muOmega for a current of 50 muA. These characteristics are comparable with those obtained in QHE devices used at Centro Nacional de Metrologia (CENAM). Such results show that the developed devices have the quality required for reference standard DC resistance measurements\",\"PeriodicalId\":125310,\"journal\":{\"name\":\"2006 3rd International Conference on Electrical and Electronics Engineering\",\"volume\":\"24 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-12-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 3rd International Conference on Electrical and Electronics Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICEEE.2006.251902\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 3rd International Conference on Electrical and Electronics Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICEEE.2006.251902","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

在过去的几年中,我们一直致力于利用量子霍尔效应(QHE)获得电阻标准。对几种AlGaAs/GaAs结构和各种欧姆接触程序进行了评估,以实现具有计量质量的器件。最近我们获得了具有以下特点的器件:在1.3 K下,在7 T量级的磁通密度下,得到了量子数i=2对应的电阻平台,在50 muA电流下,纵向电阻的残值为107 muOmega。这些特性与在国家计量中心(CENAM)使用的QHE装置中获得的特性相当。这些结果表明,所开发的器件具有参考标准直流电阻测量所需的质量
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Recent measurements of the Quantum Hall Effect in AlGaAs/GaAs Heterostructures to Obtain a Resistance Standard
In the last few years we have been working in order to obtain a resistance standard using the quantum hall effect (QHE). Several AlGaAs/GaAs structures and a variety of ohmic contacts procedures have been evaluated to achieve devices with metrological quality. Recently we have obtained devices with the following characteristics: the resistance plateau corresponding to the quantum number i=2 is obtained for a magnetic flux density in the order of 7 T at 1.3 K, the residual value of the longitudinal resistance is 107 muOmega for a current of 50 muA. These characteristics are comparable with those obtained in QHE devices used at Centro Nacional de Metrologia (CENAM). Such results show that the developed devices have the quality required for reference standard DC resistance measurements
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