利用高温高压极化改善二氧化硅的非线性

A. C. Liu, D. Pureur, M. Digonnet, G. Kino, E. Knystautas
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引用次数: 0

摘要

二氧化硅的热极化提供了令人兴奋的前景,这是第一次实现光纤形式的低损耗电光开关和调制器,与任何其他现有的调制器不同,这些设备可以融合到单模光纤上,损耗可以忽略不计。为了使这成为可能,必须增加标准热极化在二氧化硅中诱导的非线性区域的深度(几微米)和非线性系数(0.5-1 pm/V)。这些目标可以通过优化玻璃成分和/或极化工艺来实现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improving the Nonlinearity of Silica by Poling at Higher Temperature and Voltage
Thermal poling of silica offers the exciting prospect of achieving, for the first time, low-loss electro-optic switches and modulators in a fiber form, devices that can be fusion spliced to a single mode fiber with negligible loss, unlike any other existing modulator. For this to become possible, both the depth (a few microns) and the nonlinear coefficient (0.5-1 pm/V) of the nonlinear region induced in silica by standard thermal poling must be increased. These objectives may be met by optimizing the glass composition and/or the poling process.
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