{"title":"双SAW振荡器低SO/sub 2/浓度测量","authors":"E. Bodea, I. Blaga, R. Apostolescu, P. Schiopu","doi":"10.1109/SMICND.1996.557320","DOIUrl":null,"url":null,"abstract":"A device for surface acoustic wave (SAW) measurements, based on an organic sensitive film, that is triethanolamine (TEA), has been realized. A dual SAW oscillator was used to measure the frequency shift due to gas adsorption in the TEA film. A linear response was obtained in the range 0-100 ppm SO/sub 2/ and the sensibility was about 80 Hz/ppm.","PeriodicalId":266178,"journal":{"name":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Dual SAW oscillator for low SO/sub 2/ concentrations measurement\",\"authors\":\"E. Bodea, I. Blaga, R. Apostolescu, P. Schiopu\",\"doi\":\"10.1109/SMICND.1996.557320\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A device for surface acoustic wave (SAW) measurements, based on an organic sensitive film, that is triethanolamine (TEA), has been realized. A dual SAW oscillator was used to measure the frequency shift due to gas adsorption in the TEA film. A linear response was obtained in the range 0-100 ppm SO/sub 2/ and the sensibility was about 80 Hz/ppm.\",\"PeriodicalId\":266178,\"journal\":{\"name\":\"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings\",\"volume\":\"48 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-10-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.1996.557320\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.1996.557320","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Dual SAW oscillator for low SO/sub 2/ concentrations measurement
A device for surface acoustic wave (SAW) measurements, based on an organic sensitive film, that is triethanolamine (TEA), has been realized. A dual SAW oscillator was used to measure the frequency shift due to gas adsorption in the TEA film. A linear response was obtained in the range 0-100 ppm SO/sub 2/ and the sensibility was about 80 Hz/ppm.
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