光谱各向异性微椭圆偏振法测定亚微米光刻结构的横向和纵向尺寸

1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453) Pub Date : 1999-06-08 DOI:10.1109/VTSA.1999.786018

A. Michaelis, O. Gent, U. Mantz

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引用次数: 0

摘要

介绍了一种新的计量工具——光谱各向异性微椭偏仪(SAME)。该方法允许快速和精确的测量横向和纵向特征尺寸的周期性结构显示形式双折射。给出了千兆代DRAM结构的临界尺寸、锥度角和覆盖旋转测量的实例。

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Spectroscopic Anisotropy Micro-Ellipsometry (SAME) for determination of lateral and vertical dimensions of sub-micron lithographic structures

A new metrology tool, Spectroscopic Anisotropy Micro-Ellipsometry (SAME) is introduced. The method allows for a rapid and precise measurement of lateral and vertical feature sizes of periodic structures showing form birefringence. Examples of CD (critical dimensions), taper angle as well as overlay rotation measurements for gigabit generation DRAM structures are presented.

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1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453)

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