基于碳化硅外延层的快中子探测器

B. Zat’ko, F. Dubecký, A. Šagátová, K. Sedlačková, P. Boháček, M. Sekáčová, V. Nečas
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引用次数: 3

摘要

采用高质量的4H-SiC液相外延层(厚度为105 μm)制备了Au/Ni双层接触金属化形成圆形肖特基触点的探测器。该探测器结构的特点是在室温下的电流-电压测量显示出低的反向电流密度。利用平均中子能量约为4 MeV的239Pu-Be源对快中子进行了探测。检测到的光谱显示硅和碳反冲离子连续体。探测效率与探测器有源层厚度的模拟结果呈线性相关关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Detector of fast neutrons based on silicon carbide epitaxial layers
High quality liquid phase epitaxial layer of 4H-SiC with a thickness of 105 μm was used for fabrication of detector with the circular Schottky contact formed by using Au/Ni double layer contact metallization. The detector structure was characterized by current-voltage measurements showing low reverse current density at room temperature. Following the detection of fast neutrons was studied using the 239Pu-Be source with the mean neutron energy of about 4 MeV. Detected spectrum revealed silicon and carbon-recoil ion continuum. The simulation of detection efficiency vs. thickness of the detector active layer shows linear dependence.
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