Soft patterning methods for manufacturing of micro and nano-optical components

The paper presents the experimental results obtained in manufacturing of micro and nano-optical components using electron beam lithography (EBL) in a mono or multi-layer resist, lift-off and the soft lithographic techniques to transfer high-resolution patterns into other materials. The pattern from the master fabricated by EBL was transferred onto an elastomeric stamp and subsequent from the stamp onto the surface of other substrate by molding or by soft UV-nanoimprint. Optical components with different aspects and feature size, like micro-lenses, diffractive optical elements and optical waveguides have been obtained and characterized.