真空沉积聚二乙炔薄膜三阶磁化率的评价

K. Kubodera, S. Tomaru, Hayato Kobayashi, T. Kanetake, K. Ishikawa, T. Koda, K. Takeda, Y. Tokura, S. Koshihara
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引用次数: 0

摘要

聚二乙炔(PDA)由于其主链上的一维共轭π电子具有较大的三阶非线性,在光学门控开关、光学双稳器件等非线性光学器件中具有很大的应用潜力。该材料具有响应时间快、吸收损耗小的优点。非线性光学测量已用于各种样品形式,单晶(溶剂铸造膜),langumur - blodgett (LB)膜(2)和真空沉积膜(3),4)。其中,真空沉积膜是最容易制备的,因为过程干燥,不耗时。然而,与单晶(1 × 10−11 esu)和LB膜(2)相比,用常规方法沉积的膜的测量值(3)并不大(1 × 10−11 esu)。本文报道了在真空沉积法制备的高取向外延PDA薄膜中观察到相当大的χ(3)值。该χ(3)值大于LB膜,与单晶相当。为了正确地评估χ(3)值,建立了高精度的三次谐波产生(THG)测量系统。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of Third-Order Susceptibility of Vacuum-Deposited Polydiacetylene Thin Films
Polydiacetylene (PDA) has high potential for use in nonlinear optical devices, such as optically gated switches and optical bistable devices, because it has large third-order nonlinearity due to one-dimensional conjugated π-electrons in its backbone chains. This material has the advantage of very fast response time and fairly small absorption loss. Nonlinear optical measurements have been performed for various sample forms, single crystals1) solvent-cast films, Langumuir-Blodgett (LB) films2), and vacuum-deposited films3),4). Among these, vacuum-deposited films are easiest to prepare because the process is dry and not time-consuming. However, the measured χ(3) values for films deposited by the usual method were not so large (≃ 1 × 10−11 esu) compared with those of single crystals1) and LB films2). This paper reports on the fairly large χ(3) value that has been observed in a highly-oriented epitaxial PDA thin film prepared by a successful vacuum-deposition method. This χ(3) value is larger than LB films and comparable to that of single crystals. To properly evaluate the χ(3) value, a third-harmonic generation (THG) measurement system with high accuracy has been set up.
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