{"title":"通过LRM校准技术实现更高的晶圆上s参数精度","authors":"A. Davidson, E. Strid, Keith Jones","doi":"10.1109/ARFTG.1989.323957","DOIUrl":null,"url":null,"abstract":"Since the Introduction of microwave wafer probing In 1983 the dominant vector network analyzer calibration technique has been the short-open-load-thru (SOLT). The thru-reflect-line (TRL) technique has also been used In certain applications, and both approaches have enabled valuable measurements to be made with relative ease and a high degree of accuracy. Each technique, however, has drawbacks which may hinder accuracy or prevent certain applications. A new method,' line-reflect-match (LRM), circumvents many of these drawbacks, thereby allowing a more accurate and more versatile on-wafer calibration. In addition, LRM is simpler to perform because it requires fewer standards.","PeriodicalId":153615,"journal":{"name":"34th ARFTG Conference Digest","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1989-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"79","resultStr":"{\"title\":\"Achieving greater on-wafer S-parameter accuracy with the LRM calibration technique\",\"authors\":\"A. Davidson, E. Strid, Keith Jones\",\"doi\":\"10.1109/ARFTG.1989.323957\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Since the Introduction of microwave wafer probing In 1983 the dominant vector network analyzer calibration technique has been the short-open-load-thru (SOLT). The thru-reflect-line (TRL) technique has also been used In certain applications, and both approaches have enabled valuable measurements to be made with relative ease and a high degree of accuracy. Each technique, however, has drawbacks which may hinder accuracy or prevent certain applications. A new method,' line-reflect-match (LRM), circumvents many of these drawbacks, thereby allowing a more accurate and more versatile on-wafer calibration. In addition, LRM is simpler to perform because it requires fewer standards.\",\"PeriodicalId\":153615,\"journal\":{\"name\":\"34th ARFTG Conference Digest\",\"volume\":\"35 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"79\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"34th ARFTG Conference Digest\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ARFTG.1989.323957\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"34th ARFTG Conference Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ARFTG.1989.323957","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Achieving greater on-wafer S-parameter accuracy with the LRM calibration technique
Since the Introduction of microwave wafer probing In 1983 the dominant vector network analyzer calibration technique has been the short-open-load-thru (SOLT). The thru-reflect-line (TRL) technique has also been used In certain applications, and both approaches have enabled valuable measurements to be made with relative ease and a high degree of accuracy. Each technique, however, has drawbacks which may hinder accuracy or prevent certain applications. A new method,' line-reflect-match (LRM), circumvents many of these drawbacks, thereby allowing a more accurate and more versatile on-wafer calibration. In addition, LRM is simpler to perform because it requires fewer standards.