{"title":"各向同性p型多晶硅横向磁阻的计算","authors":"A. Moiseev","doi":"10.1109/SIBEDM.2007.4292934","DOIUrl":null,"url":null,"abstract":"Calculation of the dependence of the transverse magnetoresistance in isotropic p-type polycrystalline silicon on a magnetic field is presented. The case is considered when holes relaxation is determined by scattering on both the grain boundaries potential barriers and the disordered net of silicon atoms.","PeriodicalId":106151,"journal":{"name":"2007 8th Siberian Russian Workshop and Tutorial on Electron Devices and Materials","volume":"534 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-08-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Calculation of Transverse Magnetoresistance in Isotropic p-Type Polycrystalline Silicon\",\"authors\":\"A. Moiseev\",\"doi\":\"10.1109/SIBEDM.2007.4292934\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Calculation of the dependence of the transverse magnetoresistance in isotropic p-type polycrystalline silicon on a magnetic field is presented. The case is considered when holes relaxation is determined by scattering on both the grain boundaries potential barriers and the disordered net of silicon atoms.\",\"PeriodicalId\":106151,\"journal\":{\"name\":\"2007 8th Siberian Russian Workshop and Tutorial on Electron Devices and Materials\",\"volume\":\"534 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-08-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 8th Siberian Russian Workshop and Tutorial on Electron Devices and Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SIBEDM.2007.4292934\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 8th Siberian Russian Workshop and Tutorial on Electron Devices and Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SIBEDM.2007.4292934","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Calculation of Transverse Magnetoresistance in Isotropic p-Type Polycrystalline Silicon
Calculation of the dependence of the transverse magnetoresistance in isotropic p-type polycrystalline silicon on a magnetic field is presented. The case is considered when holes relaxation is determined by scattering on both the grain boundaries potential barriers and the disordered net of silicon atoms.