宽带隙二极管的反向击穿时间

J. Flicker, Emily Schrock, R. Kaplar
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引用次数: 0

摘要

为了评估宽和超宽带隙器件中雪崩击穿的时间演化,我们已经开发了一种电缆脉冲发生器实验装置,可以评估半导体器件的终端阻抗的时间演变,时间分辨率为130 ps。我们已经利用该脉冲发生器装置来评估垂直氮化镓和碳化硅二极管的击穿时间,这些二极管可能用作电网中防止快速瞬态电压脉冲(例如由电磁脉冲事件引起的脉冲)的保护元件。我们发现,与碳化硅器件相比,氮化镓器件表现出更快的动态特性,在1.37 ns内实现90%导通,而SiC器件的响应时间为2.98 ns。氮化镓器件的击穿时间与施加电压没有明显的相关性,而碳化硅器件的击穿时间与施加电压有很强的相关性,范围从1.33 kV时的2.97 ns到2.6 kV时的0.78 ns。氮化镓和碳化硅器件的快速响应时间(< 5 ns)表明这两种材料系统都可以满足严格的响应时间要求,并且可能适合作为电磁脉冲瞬变的保护元件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reverse Breakdown Time of Wide Bandgap Diodes
In order to evaluate the time evolution of avalanche breakdown in wide and ultra-wide bandgap devices, we have developed a cable pulser experimental setup that can evaluate the time-evolution of the terminating impedance for a semiconductor device with a time resolution of 130 ps. We have utilized this pulser setup to evaluate the time-to-breakdown of vertical Gallium Nitride and Silicon Carbide diodes for possible use as protection elements in the electrical grid against fast transient voltage pulses (such as those induced by an electromagnetic pulse event). We have found that the Gallium Nitride device demonstrated faster dynamics compared to the Silicon Carbide device, achieving 90% conduction within 1.37 ns compared to the SiC device response time of 2.98 ns. While the Gallium Nitride device did not demonstrate significant dependence of breakdown time with applied voltage, the Silicon Carbide device breakdown time was strongly dependent on applied voltage, ranging from a value of 2.97 ns at 1.33 kV to 0.78 ns at 2.6 kV. The fast response time (< 5 ns) of both the Gallium Nitride and Silicon Carbide devices indicate that both materials systems could meet the stringent response time requirements and may be appropriate for implementation as protection elements against electromagnetic pulse transients.
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