SOI动态阈值电压MOS晶体管的高频特性

V. Ferlet-Cavrois, A. Bracale, N. Fel, O. Musseau, C. Raynaud, O. Faynot, J. Pelloie
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引用次数: 9

摘要

DTMOS架构特别适合非常低的电源电压应用(0.5-0.6 V) (Colinge, 1987;Matloubian, 1993;Assaderaghi et al., 1994;Pelloie et al., 1999)。本文介绍了部分耗尽0.25 /spl mu/m SOI技术处理的DTMOS器件的高频行为(Wilson et al., 1997;Lagnado and de la Houssaye, 1997;电缆,1997;Ferlet-Cavrois等人,1998;Tanaka et al., 1997)。通过与浮体和接地体MOS晶体管的比较,说明了SOI型DTMOS在极低功耗便携式通信系统中的优势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High frequency characterization of SOI dynamic threshold voltage MOS (DTMOS) transistors
The DTMOS architecture is particularly suited to very low supply voltage applications (0.5-0.6 V) (Colinge, 1987; Matloubian, 1993; Assaderaghi et al., 1994; Pelloie et al., 1999). This paper presents the high frequency behavior of DTMOS devices processed with a partially depleted 0.25 /spl mu/m SOI technology (Wilson et al., 1997; Lagnado and de la Houssaye, 1997; Cable, 1997; Ferlet-Cavrois et al., 1998; Tanaka et al., 1997). The paper compares DTMOS to floating body and grounded body MOS transistors, and shows the advantage of SOI DTMOS for very low power portable telecommunication systems.
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