瞬变电磁法在微电子领域的最新应用进展

1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105) Pub Date : 1998-10-21 DOI:10.1109/ICSICT.1998.785884

T. Sheng, C. Tung, J.L.F. Wang

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引用次数: 0

摘要

透射电子显微镜(TEM)在硅VLSI/ULSI工艺评价和失效分析中发挥了重要作用。近年来，它也被应用于微机电系统(MEMS)、MCM等。在这次演讲中，介绍了TEM的一些最新应用进展。这些TEM的一些应用在以前可能看起来非常困难或不可能。这些新的应用是通过创新的样品制备突破而实现的。

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The recent TEM application development for microelectronics

Transmission electron microscopy (TEM) has played an important role in silicon VLSI/ULSI process evaluation and failure analysis. More recently, it has also been applied to micro-electro-machine system (MEMS), MCM, ...etc. In this talk, a few recent TEM application developments are presented. Some of these TEM applications may seem very difficult or impossible previously. These new applications are made possible by innovative sample preparation break through.

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1998 5th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.98EX105)

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