高强度加速器用离子注入器

M. Stockli, T. Nakagawa
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引用次数: 11

摘要

离子加速器的应用越来越多,对束流的要求越来越复杂,束流强度也越来越高。离子注入器的性能对这些项目的成功至关重要。首先,离子源必须产生所需的离子种类,而各种各样的所需离子种类需要非常不同的离子源。此外,离子源必须以所需的速率产生这些离子,并且没有使人衰弱的杂质,以及具有所需的占空因数。几个例子将表明,当占空因数增加时,非常成功的离子源可能会失效,因为它们的寿命变得太短或故障率太高。同样重要的是这些离子的提取和它们的传输到下一个加速阶段,因为缓慢的离子速度对增加强度构成了严重的挑战。随着光束强度的增加,其发射度、稳定性和可控性变得越来越重要。本文无法深入讨论这个主题。它试图提供一种复杂的味道,并作为进一步阅读和研究的介绍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ion Injectors for High-Intensity Accelerators
There are a growing number of applications for ion accelerators, with increasingly complex beam requirements and progressively higher beam intensities. The performance of the ion injector is critical to the success of these projects. First, there is the ion source that has to produce the desired ion species, with a large variety of desired species requiring vastly different ion sources. In addition, the ion source has to produce those ions with the desired rate and without debilitating impurities, as well as with the desired duty factor. Several examples will show that very successful ion sources can fail when the duty factor is increased because their lifetime becomes too short or their failure rate too high. Equally important is the extraction of those ions and their transport to the next stage of acceleration, because the slow ion velocities pose a serious challenge to increasing the intensity. As the beam intensity is increased, its emittance, stability and controllability become more important. This article cannot cover this subject in depth. It tries to provide a flavor of the complexities and serve as an introduction to further reading and studies.
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