基于流水线的三维片上网络层间总线结构

M. Daneshtalab, M. Ebrahimi, P. Liljeberg, J. Plosila, H. Tenhunen
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引用次数: 2

摘要

直接垂直互连的结构,称为硅通孔(tsv),是3D集成电路领域的一个重要问题。基于总线和基于网络的结构是实现tsv作为3D集成电路层间连接的两种主要架构。这两种实现都有一些缺点。前者可扩展性差,在高注入速率下性能会下降,而后者消耗更多的面积和功耗。在本文中,我们提出了一种新的tsv管道总线结构,以改善先前基于总线的架构的性能。该结构可以利用双同步FIFO实现堆叠层间的同步,但各层的制作工艺不同。综合测试用例的实验结果表明,该架构显著改善了平均网络延迟。此外,所提出的母线结构的硬件面积和功耗分别比tsv的典型母线结构小9%和11%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pipeline-based interlayer bus structure for 3D networks-on-chip
The structure of direct vertical interconnections, called Through Silicon Vias (TSVs), is an important issue in the realm of 3D ICs. The bus-based and network-based structures are the two dominant architectures for implementing TSVs as interlayer connection in 3D ICs. Both implementations have some disadvantages. The former suffers from poor scalability and deteriorates the performance at high injection rates, and the latter consumes more area and power dissipation. In this paper, we propose a novel pipeline bus structure for TSVs to improve the performance of the prior bus-based architecture. The presented structure can utilize bi-synchronous FIFO for synchronization between stacked layers if each layer is fabricated by different technologies. Experimental results with synthetic test cases demonstrate that the proposed architecture gives significant improvements in average network latency. Also, the hardware area and power consumption of the presented bus structure are 9% and 11% less than the typical bus structure of TSVs, respectively.
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