小通道面积器件上nbti诱导阈值电压偏移的统计观察

Takashi Sato, H. Awano, Hirofttmi Shimizu, Hiroshi Tsutsui, H. Ochi
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引用次数: 5

摘要

小型化器件的性能变异性已成为电子系统设计的主要障碍。阈值电压的时间退化及其变化将成为确保其可靠性的另一个问题。本文基于对大量器件的测量结果,给出了器件退化和恢复的统计性质。测量数据是通过器件阵列电路获得的,该电路适合于有效地收集非常小通道面积器件的退化和恢复的统计数据。在我们的测量中发现阈值电压的阶梯状变化表明电荷捕获和发射可能在器件退化过程中起关键作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Statistical observations of NBTI-induced threshold voltage shifts on small channel-area devices
Performance variability of miniaturized devices has become a major obstacle for designing electronic systems. Temporal degradation of threshold voltages and its variation are going to be an additional concerns to ensure their reliability. In this paper, based on measurement results on large number of devices, we present statistical properties of device degradation and recovery. The measurement data is obtained by using a device-array circuit suitable for efficiently collect statistical data on degradations and recoveries of very small channel-area devices. Stair-like change of threshold voltages found in our measurement suggests that charge trapping and emission may play a key role in the device degradation process.
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